EzhouFunctional oxide film on the RPS chamber of the remote plasma source

Send email

Product Description

The functional oxide film for RPS chambers is a specialized coating designed for remote plasma source (RPS) chambers used in the semiconductor manufacturing industry. This film meets eight critical performance criteria—no microcracks, high strength, acid resistance, electrical insulation, and low outgassing—making it indispensable for ensuring reliable semiconductor fabrication.

Request a quote now

*Note: Please ensure that all relevant information is accurately provided and keep your communication channels open. We will contact you as soon as possible.

You can receive professional sales advice within 24 hours.


Contact us now for a quick response.

%{tishi_zhanwei}%