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BL Ultra-Stable Functional Oxide Film
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This oxide film is a unique functional coating formed via dual-electrolytic deposition, specifically developed for the lithography equipment industry. It not only withstands ultraviolet radiation at 193 nm and 248 nm wavelengths but also exhibits low reflectivity, making it critical for reducing surface dust adhesion and outgassing from aluminum alloy components in lithography systems.
As a three‑step solution for the domestic substitution of Bilatal’s functional oxide membranes, BL’s ultra‑stable functional oxide membrane delivers performance that fully matches that of the Dutch Bilatal membrane. Currently, BL membranes have been successfully deployed on lithography tools from Shanghai Micro Electronics and Shenzhen Xinkailai.
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BL Ultra-Stable Functional Oxide Film
Haven’t decided yet? Get a sample first,Contact us!
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