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Functional oxide film on the RPS chamber of the remote plasma source
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The functional oxide film for RPS chambers is a specialized coating designed for remote plasma source (RPS) chambers used in the semiconductor manufacturing industry. This film meets eight critical performance criteria—no microcracks, high strength, acid resistance, electrical insulation, and low outgassing—making it indispensable for ensuring reliable semiconductor fabrication.
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Functional oxide film on the RPS chamber of the remote plasma source
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